Micromachining and focused ion beam etching of Si for accelerometers

Micromachining and focused ion beam etching of Si for accelerometers

著者名:

Moore,D.F. ( Univ.of Cambridge )

掲載資料名:

Micromachining and microfabrication process technology : 23-24 October, 1995, Austin, Texas

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2639

発行年:

1995

開始ページ:

253

終了ページ:

258

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420053 [0819420050]

言語:

英語

請求記号:

P63600/2639

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016532
シリーズID:	PA00000029
会議名:	Micromachining and Microfabrication : Micromachining and Microfabrication Process Technology
回次:	1995
会議開催地:	Austin, TX, USA
会議開催年:	1995.10.23-1995.10.24

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