Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry

Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry

著者名:

掲載資料名:

Materials science applications of ion beam techniques : proceedings of the International Symposium on Materials Science Applications of Ion Beam Techniques, incoeporating the 1st German-Australian Workshop on Ion Beam Analysis, Seeheim, Germany, September 9-12 1996

シリーズ名:

Materials science forum

シリーズ巻号:

248-249

発行年:

1997

開始ページ:

229

終了ページ:

232

出版情報:

Zuerich, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878497676 [0878497676]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016500
シリーズID:	PA00000012
会議名:	International Symposium on Materials Science Applications of Ion Beam Techniques ; German-Australian Workshop on Ion Beam Analysis
回次:	1996 ; 1st
会議開催地:	Seeheim, Germany
会議開催年:	1996.09.09-1996.09.12

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