0.35-ｦﾌm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology

0.35-ｦﾌm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology

著者名:

Raphaelian,M.L. ( Micrion Corp.(USA) )
Ellis,M. ( Micrion Corp.(USA) )
Ferranti,D.C. ( Micrion Corp.(USA) )
Stewart,D.K. ( Micrion Corp.(USA) )

掲載資料名:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3096

発行年:

1997

開始ページ:

383

終了ページ:

397

出版情報:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

言語:

英語

請求記号:

P63600/3096

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016472
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1997 : 4th
会議開催地:	Kawasaki, Japan
会議開催年:	1997.04.17-1997.04.18

類似資料:

1 国際会議録 Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology Raphaelian,M.L., Carolan,D., Casey,J.D.,Jr., Doyle,A.F., Ellis,M., Ferranti,D.C., Lessing,J., Rose,K., Stewart,D.K., … SPIE-The International Society for Optical Engineering	7 国際会議録 Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks Casey,J.D.,Jr., Doyle,A.F., Stewart,D.K., Ferranti,D.C., Raphaelian,M.L., Morgan,J.C. SPIE-The International Society for Optical Engineering
2 国際会議録 Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks Raphaelian,M.L., Casey,J.d., Doyle,A.F., Ferranti,D.C., Morgan,J.C. SPIE-The International Society for Optical Engineering	8 国際会議録 Advancements in focused ion-beam repair of MoSiON phase-shifting masks Lessing, J., Ferranti, D. C., Sundaram, G., Nagal, L., Verbeek, M. SPIE - The International Society of Optical Engineering
3 国際会議録 Repair and printability study of binary chrome masks with OPC features for 0.18-ｦﾌm technology node Stewart,D.K., Ferranti,D.C., Morgan,J.C., Lessing,J., Kuo,J., Chiu,C.S.G. SPIE - The International Society for Optical Engineering	9 国際会議録 Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., … SPIE - The International Society for Optical Engineering
4 国際会議録 Focused ion beam (FIB) repair of embedded shifter masks J.C. Morgan, D.C. Ferranti, C. Pennelli, A. Saxonis, W.C. Joyce Society of Photo-optical Instrumentation Engineers	10 国際会議録 Manufacturing optimization strategies for 0.35-ｦﾌm design rules Tyminski,J.K., McNamara,S.J., Sasaya,T., Komatsu,M., Humphrey,D.C., Winslow,A. SPIE-The International Society for Optical Engineering
5 国際会議録 Critical dimension control for i-line 0.35-ｦﾌm device using a new antireflective coating Baker,D.C., Capsuto,E.S. SPIE-The International Society for Optical Engineering	11 国際会議録 Optimization of PVD Ti/CVD TiN Liner for 0.35 ｦﾌm Tungsten Plug Technology Wang, C.-K., Liu, L. M., Liao, D. M., Smith, D. C., Danek, M. MRS - Materials Research Society
6 国際会議録 Chemically enhanced focused-ion-beam(FIB)repair of opaque defects on chrome photomasks Casey,J.D.,Jr., Doyle,A.F., Stewart,D.K., Ferranti,D.C. SPIE-The International Society for Optical Engineering	12 国際会議録 Lithographic performance at 0.3-to 0.35-ｦﾌm patterns by using i-line stepper with off-axis illumination technology Lin,C.-L., Dai,C.-M., Lin,C.-Y. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12