Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask
- 著者名:
- Petersen,J.S. ( SEMATECH(USA) )
- Williams,A.M. ( SEMATECH(USA) )
- Rich,G.K. ( SEMATECH(USA) )
- Miller,D.A. ( SEMATECH(USA) )
- Martinez,A.M.,Jr. ( SEMATECH(USA) )
- 掲載資料名:
- Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3096
- 発行年:
- 1997
- 開始ページ:
- 375
- 終了ページ:
- 382
- 出版情報:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819425164 [0819425168]
- 言語:
- 英語
- 請求記号:
- P63600/3096
- 資料種別:
- 国際会議録
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