Chemically enhanced focused-ion-beam(FIB)repair of opaque defects on chrome photomasks

Chemically enhanced focused-ion-beam(FIB)repair of opaque defects on chrome photomasks

著者名:

Casey,J.D.,Jr. ( Micrion Corp.(USA) )
Doyle,A.F. ( Micrion Corp.(USA) )
Stewart,D.K. ( Micrion Corp.(USA) )
Ferranti,D.C. ( Micrion Corp.(USA) )

掲載資料名:

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3096

発行年:

1997

開始ページ:

322

終了ページ:

332

出版情報:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

言語:

英語

請求記号:

P63600/3096

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016472
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1997 : 4th
会議開催地:	Kawasaki, Japan
会議開催年:	1997.04.17-1997.04.18

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