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Automated OPC for application in advanced lithography(Invited Paper)

著者名:
Ronse,K. ( Interuniv.Microelectronics Ctr.(Belgium) )
Tritchkov,A. ( Interuniv.Microelectronics Ctr.(Belgium) )
Randall,J. ( Interuniv.Microelectronics Ctr.(Belgium) )
Jonckheere,R. ( Interuniv.Microelectronics Ctr.(Belgium) )
Ghandehari,K. ( Interuniv.Microelectronics Ctr.(Belgium) )
Van den hove,L. ( Interuniv.Microelectronics Ctr.(Belgium) )
さらに 1 件
掲載資料名:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3096
発行年:
1997
開始ページ:
138
終了ページ:
144
出版情報:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425164 [0819425168]
言語:
英語
請求記号:
P63600/3096
資料種別:
国際会議録

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