Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology

Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology

著者名:

Raphaelian,M.L. ( Micrion Corp. )

Carolan,D. ( Micrion Corp. )

Casey,J.D.,Jr. ( Micrion Corp. )

Doyle,A.F. ( Micrion Corp. )

Ellis,M. ( Micrion Corp. )

Ferranti,D.C. ( Micrion Corp. )

Lessing,J. ( Micrion Corp. )

Rose,K. ( Micrion Corp. )

Stewart,D.K. ( Micrion Corp. )

White,R.L. ( SEMATECH,Intel Corp.,and MIT Lincoln Corp. )

さらに 5 件

掲載資料名:

17th Annual BACUS Symposium on Photomask Technology and Management

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3236

発行年:

1998

開始ページ:

471

終了ページ:

486

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426697 [0819426695]

言語:

英語

請求記号:

P63600/3236

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016458
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
回次:	1997 : 17th
会議開催地:	Redwood City, California, USA
会議開催年:	1997.09.17-1997.09.19

類似資料:

1 国際会議録 Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks Raphaelian,M.L., Casey,J.d., Doyle,A.F., Ferranti,D.C., Morgan,J.C. SPIE-The International Society for Optical Engineering	7 国際会議録 State of the art in focused ion-beam mask repair systems D.K. Stewart, J.A. Doherty, A.F. Doyle, J.C. Morgan Society of Photo-optical Instrumentation Engineers
2 国際会議録 Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks Casey,J.D.,Jr., Doyle,A.F., Stewart,D.K., Ferranti,D.C., Raphaelian,M.L., Morgan,J.C. SPIE-The International Society for Optical Engineering	8 国際会議録 Repair and printability study of binary chrome masks with OPC features for 0.18-ｦﾌm technology node Stewart,D.K., Ferranti,D.C., Morgan,J.C., Lessing,J., Kuo,J., Chiu,C.S.G. SPIE - The International Society for Optical Engineering
3 国際会議録 Chemically enhanced focused-ion-beam(FIB)repair of opaque defects on chrome photomasks Casey,J.D.,Jr., Doyle,A.F., Stewart,D.K., Ferranti,D.C. SPIE-The International Society for Optical Engineering	9 国際会議録 Focused ion beam (FIB) repair of embedded shifter masks J.C. Morgan, D.C. Ferranti, C. Pennelli, A. Saxonis, W.C. Joyce Society of Photo-optical Instrumentation Engineers
4 国際会議録 0.35-ｦﾌm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology Raphaelian,M.L., Ellis,M., Ferranti,D.C., Stewart,D.K. SPIE-The International Society for Optical Engineering	10 国際会議録 Predicting image placement accuracy of x-ray masks Dicks, G.A., Engelstad, R.L., Lovell, E.G., Boerger, B.E., Fleming, D.J., Brown, K.H. SPIE - The International Society of Optical Engineering
5 国際会議録 Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair D.K. Stewart, A.F. Doyle, J.D. Casey Society of Photo-optical Instrumentation Engineers	11 国際会議録 Advancements in focused ion-beam repair of MoSiON phase-shifting masks Lessing, J., Ferranti, D. C., Sundaram, G., Nagal, L., Verbeek, M. SPIE - The International Society of Optical Engineering
6 国際会議録 Material removal strategies and results for 193-nm lithography using FIB mask repair Ferranti, D.C., Graupera, A., Marshman, J., Stewart, D.K., Szelag, S.M. SPIE - The International Society of Optical Engineering	12 国際会議録 Optimization of EUVL reticle thickness for image placement accuracy Zheng, L., Mikkelson, A.R., Abdo, A.Y., Engelstad, R.L., Lovell, E.G., White, T.J. SPIE - The International Society of Optical Engineering

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