Evaluation of resist models for fast optical proximity correction

Evaluation of resist models for fast optical proximity correction

著者名:

Dolainsky,C. ( aiss GmbH (FRG) )
Maurer,W. ( Siemens AG (FRG) )
Waas,T. ( aiss GmbH (FRG) )

掲載資料名:

17th Annual BACUS Symposium on Photomask Technology and Management

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3236

発行年:

1998

開始ページ:

202

終了ページ:

207

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426697 [0819426695]

言語:

英語

請求記号:

P63600/3236

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016458
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
回次:	1997 : 17th
会議開催地:	Redwood City, California, USA
会議開催年:	1997.09.17-1997.09.19

類似資料:

1 国際会議録 Application of a simple resist model to fast optical proximity correction Dolainsky,C., Maurer,W. SPIE-The International Society for Optical Engineering	7 国際会議録 Application of a new approach to optical proximity correction Rosenbusch,A., Hourd,A.C., Juffermans,C.A., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., … SPIE - The International Society for Optical Engineering
2 国際会議録 Integration of alternating phase-shift mask technology into optical proximity correction Thiele,J., Friedrich,C., Dolainsky,C., Karakatsanis,P., Maurer,W. SPIE - The International Society for Optical Engineering	8 国際会議録 New approach to optical proximity correction Rosenbusch,A., Juffermans,A.H., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., Simecek,M., … SPIE - The International Society for Optical Engineering
3 国際会議録 Process proximity correction using an automated software tool Maurer,W., Dolainsky,C., Thiele,J., Friedrich,C., Karakatsanis,P. SPIE-The International Society for Optical Engineering	9 国際会議録 Flows for model-based layout correction of mask proximity effects Cobb, N.B., Maurer, W. SPIE - The International Society of Optical Engineering
4 国際会議録 Two threshold resist models for optical proximity correction Huang, W.-C., Lin, C.-H., Kuo, C.-C., Huang, C.C., Lin, J.F., Chen, J.-H., Liu, R.-G., Ku, Y.C., Lin, B.-J. SPIE - The International Society of Optical Engineering	10 国際会議録 Geometrical E-beam proximity correction for raster scan systems Belic,N., Eisenmann,H., Hartmann,H., Waas,T. SPIE - The International Society for Optical Engineering
5 国際会議録 Evaluation of a fast and flexible OPC package:OPTISSIMO Maurer,W., Waas,Th., Eisenmann,H. SPIE-The International Society for Optical Engineering	11 国際会議録 Characterization of optical proximity correction features Allgair,J.A., Ivy,M., Lucas,K., Sturtevant,J.L., Elliott,R.C., Mack,C.A., MacNaughton,C.W., Miller,J.D., Pochkowski,M., … SPIE-The International Society for Optical Engineering
6 国際会議録 Benchmarking of software tools for optical proximity correction Jungmann,A., Thiele,J., Friedrich,C., Pforr,R., Maurer,W. SPIE-The International Society for Optical Engineering	12 国際会議録 Experimental results on optical proximity correction with variable-threshold resist model Cobb,N.B., Zakhor,A., Reihani,M., Jahansooz,F., Raghavan,V.N. SPIE-The International Society for Optical Engineering

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