Blank Cover Image

Performance of positive-tone chemically amplified resists for next-generation photomask fabrication

著者名:
Segawa,T. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Kurihara,M. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Sasaki,S. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Inomata,H. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Hayashi,N. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Sano,H. ( Dai Nippon Printing Co.,Ltd. (Japan) )
さらに 1 件
掲載資料名:
17th Annual BACUS Symposium on Photomask Technology and Management
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3236
発行年:
1998
開始ページ:
82
終了ページ:
93
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
言語:
英語
請求記号:
P63600/3236
資料種別:
国際会議録

類似資料:

1 国際会議録 Performance of a chemically amplified positive resist for next-generation photomask fabrication

Kurihara,M., Segawa,T., Okuno,D., Hayashi,N., Sano,H.

SPIE-The International Society for Optical Engineering
7 国際会議録 Deblocking reaction of chemically amplified positive DUV resists

Yamana,M., Itani,T., Yoshino,H., Hashimoto,S., Samoto,N., Kasama,K.

SPIE-The International Society for Optical Engineering
2 国際会議録 Application of chemically amplified resists to photomask fabrication

M. Arai, H. Inomata, T. Nishimura, M. Kurihara, N. Hayashi

Society of Photo-optical Instrumentation Engineers
8 国際会議録 EBR900 processes in e-beam and laser beam lithographies for photomask fabrication

M. Kurihara, M. Komada, H. Moro-oka, N. Hayashi, H. Sano

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Influence of the baking process for chemically amplified resist on CD performance

Sasaki, S., Ohfuji, T., Kurihara, M., Inomata, H., Jackson, C.A., Murata, Y., Totsukawa, D., Tsugama, N., Kitano, N., …

SPIE-The International Society for Optical Engineering
9 国際会議録 Methodology of adhesive energy for photomask fabrication using scanning probe microscopy

S. Shimada, T. Shimomura, K. Yoshida, M. Kurihara, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
4 国際会議録 Chemically amplified positive resist for next-generation photomask fabrication

Katoh,K., Kasuya,K., Arai,T., Sakamizu,T., Satoh,H., Saitoh,H., Hoga,M.

SPIE - The International Society for Optical Engineering
10 国際会議録 Photomask process development for next generation lithography [5853-117]

Sasaki, S., Itoh, K., Fujii, A., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
5 国際会議録 Development of photomask process with precise CD control,and an approach for DFM(defect-free manufacturing)using a cluster tool

Sasaki,S., Yokoyama,T., Kurihara,M., Miyashita,H., Hayashi,N., Sano,H.

SPIE - The International Society for Optical Engineering
11 国際会議録 Quarter-and subquarter-micron deep-UV lithography with chemically amplified positive resist

Onishi,Y., Sato,K., Chiba,K., Asano,M., Niki,H., Hayase,R.H., Hayashi,T.

SPIE-The International Society for Optical Engineering
6 国際会議録 Primary evaluation of proximity and resist heating effects observed in high-acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication

Kuwahara, N., Nakagawa, H., Kurihara, M., Hayashi, N., Sano, H., Maruta, E., Takikawa, T., Noguchi, S.

SPIE - The International Society of Optical Engineering
12 国際会議録 Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems

Komada,M., Kurihara,M., Sasaki,S., Makabe,T., Hayashi,N.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12