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Response-surface-based optimization of 0.1-ｦﾌm PMOSFETs with ultrathin gate stack dielectrics

著者名:
掲載資料名:
Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3506
発行年:
1998
開始ページ:
253
終了ページ:
264
出版情報:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429650 [0819429651]
言語:
英語
請求記号:
P63600/3506
資料種別:
国際会議録

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