Optimized shallow trench isolation for sub-0.18-ヲフm ASIC technologies
- 著者名:
Nouri,F. ( VLSI Technology,Inc. ) Laparra,O. ( VLSI Technology,Inc. ) Sur,H. ( VLSI Technology,Inc. ) Saha,S. ( VLSI Technology,Inc. ) Pramanik,D. ( VLSI Technology,Inc. ) Manley,M. ( VLSI Technology,Inc. ) - 掲載資料名:
- Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3506
- 発行年:
- 1998
- 開始ページ:
- 156
- 終了ページ:
- 166
- 出版情報:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429650 [0819429651]
- 言語:
- 英語
- 請求記号:
- P63600/3506
- 資料種別:
- 国際会議録
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5
国際会議録
Process control and optimization of conventional metal process for 0.18-ヲフm logic technology
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SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |