FRAM technologies compatible with 0.5-ヲフm CMOS logics (Invited Paper)
- 著者名:
Furumura,Y. ( Fujitsu Ltd. (Japan) ) Yamazaki,T. ( Fujitsu Ltd. (Japan) ) Nakamura,M. ( Fujitsu Ltd. (Japan) ) Inoue,K. ( Fujitsu Ltd. (Japan) ) Miyazawa,H. ( Fujitsu Ltd. (Japan) ) Sashida,N. ( Fujitsu Ltd. (Japan) ) Satomi,R. ( Fujitsu Ltd. (Japan) ) Katoh,Y. ( Fujitsu Ltd. (Japan) ) Ozawa,S. ( Fujitsu Ltd. (Japan) ) Takai,K. ( Fujitsu Ltd. (Japan) ) Noshiro,H. ( Fujitsu Ltd. (Japan) ) Shinohara,R. ( Fujitsu Ltd. (Japan) ) Obata,V. ( Fujitsu Ltd. (Japan) ) Kerry,A. ( Fujitsu Ltd. (Japan) ) Tani,K. ( Fujitsu Ltd. (Japan) ) Nakashima,S. ( Fujitsu Ltd. (Japan) ) Nakajima,T. ( Fujitsu Ltd. (Japan) ) Imal,M. ( Fujitsu Ltd. (Japan) ) Takesima,T. ( Fujitsu Ltd. (Japan) ) Teramoto,T. ( Fujitsu Ltd. (Japan) ) - 掲載資料名:
- Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3506
- 発行年:
- 1998
- 開始ページ:
- 56
- 終了ページ:
- 64
- 出版情報:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429650 [0819429651]
- 言語:
- 英語
- 請求記号:
- P63600/3506
- 資料種別:
- 国際会議録
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9
国際会議録
Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 ヲフm
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MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
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