Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper)

Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper)

著者名:

Hattangady,S.V. ( Texas Instruments Inc. )

Grider,O.T. ( Texas Instruments Inc. )

Kraft,R. ( Texas Instruments Inc. )

Shiau,W.-T. ( Texas Instruments Inc. )

Douglas,M.A. ( Texas Instruments Inc. )

Nicollian,P. ( Texas Instruments Inc. )

Rodder,M. ( Texas Instruments Inc. )

Brown,G.A. ( Texas Instruments Inc. )

Chatterjee,A. ( Texas Instruments Inc. )

Hu,J.C. ( Texas Instruments Inc. )

Aur,A. ( Texas Instruments Inc. )

Tsai,H.-L. ( Texas Instruments Inc. )

Chapman,R.A. ( Texas Instruments Inc. )

Eklund,R.H. ( Texas Instruments Inc. )

Chen,I.C. ( Texas Instruments Inc. )

Pas,M.F. ( Texas Instruments Inc. )

さらに 11 件

掲載資料名:

Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3506

発行年:

1998

開始ページ:

30

終了ページ:

40

出版情報:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819429650 [0819429651]

言語:

英語

請求記号:

P63600/3506

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016438
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Microelectronic device technology
回次:	1998 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.09.23-1998.09.24

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