High transmission mask technology for 45nm node imaging [6154-50]
- Author(s):
Conley, W. ( Freescale Semiconductor, Inc. (USA) ) Morgana, N. ( Photronics Inc. (France) ) Kasprowicz B S ( Photronics Inc. (USA) ) Cangemi M ( Photronics Inc. (USA) ) Lassiter M ( Photronics Inc. (France) ) Litt L C ( Freescale Semiconductor, Inc. (USA) ) Cangemin M ( Photronlcs. Inc. (USA) ) Cottle R ( Photronlcs. Inc. (USA) ) Wu W ( Freescale Semiconductor, Inc. (USA) ) Cobb J ( Freescale Semiconductor, Inc. (USA) ) Ham Y M ( Photronlcs. Inc. (USA) ) Lucas, K. ( Freescale Semiconductor, Inc. (France) ) Roman, B. ( Freescale Semiconductor, Inc. (USA) ) Porgler, C. ( Photronlcs. Inc. (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61541D
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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