Novel high refractive index fluids for 193-nm immersion lithography [6154-183]
- Author(s):
Santillan J ( Semiconductor Leading Edge Technologies Inc (Japan) ) Otoguro A ( Semiconductor Leading Edge Technologies Inc (Japan) ) Itani t ( Semiconductor Leading Edge Technologies Inc (Japan) ) Fujii K ( Semiconductor Leading Edge Technologies Inc (Japan) ) Kagayama A ( Mitsui Chemicals Inc (Japan) ) Nakano T ( Mitsui Chemicals Inc (Japan) ) Nakayama N ( Mitsui Chemicals Inc (Japan) ) Tamatani H ( Mitsui Chemicals Inc (Japan) ) Fukuda S ( Mitsui Chemicals Inc (Japan) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 3
- Page(from):
- 61544Q
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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