Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs
- Author(s):
Zibold, A.M. ( Carl Zeiss Semiconductor Metrology Systems GmbH (Germany) ) Schmid, R.M. ( Carl Zeiss Semiconductor Metrology Systems GmbH (Germany) ) Stegemann, B. ( Carl Zeiss Semiconductor Metrology Systems GmbH (Germany) ) Scheruebl, T. ( Carl Zeiss Semiconductor Metrology Systems GmbH (Germany) ) Harnisch, W. ( Carl Zeiss Semiconductor Metrology Systems GmbH (Germany) ) Kobiyama, Y. ( Carl Zeiss Tokyo Ltd. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5446
- Pub. Year:
- 2004
- Page(from):
- 728
- Page(to):
- 736
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- Language:
- English
- Call no.:
- P63600/5446.2
- Type:
- Conference Proceedings
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