SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES
- Author(s):
Verhaverbeke, S. Alay, J. Mertens, P. Meuris, M. Heyns, M. Vandervorst, W. Murrell, M. Sofield, C. - Publication title:
- Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 259
- Pub. Year:
- 1992
- Page(from):
- 391
- Page(to):
- 398
- Pages:
- 8
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991545 [1558991549]
- Language:
- English
- Call no.:
- M23500/259
- Type:
- Conference Proceedings
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