Blank Cover Image

Novel high refractive index fluids for 193-nm immersion lithography [6154-183]

Author(s):
Santillan J ( Semiconductor Leading Edge Technologies Inc (Japan) )
Otoguro A ( Semiconductor Leading Edge Technologies Inc (Japan) )
Itani t ( Semiconductor Leading Edge Technologies Inc (Japan) )
Fujii K ( Semiconductor Leading Edge Technologies Inc (Japan) )
Kagayama A ( Mitsui Chemicals Inc (Japan) )
Nakano T ( Mitsui Chemicals Inc (Japan) )
Nakayama N ( Mitsui Chemicals Inc (Japan) )
Tamatani H ( Mitsui Chemicals Inc (Japan) )
Fukuda S ( Mitsui Chemicals Inc (Japan) )
4 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
61544Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Analysis of 193-nm immersion specific defects [6153-62]

Otoguro, A, Lee, J W, Itani, T, Fujii, K, Funakoshi, T, Sakai, T, Watanabe, K, Arakawa, M, Nakano, H, Kobayashi, M

SPIE - The International Society of Optical Engineering
7 Conference Proceedings 157-nm single-layer resist based on novel monocyclic fluorinated polymer

Otoguro, A., Irie, S., Itani, T., Fujii, K., Takebe, Y., Kawaguchi, Y., Yokokoji, O.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings High-index fluoride materials for 193 nm immersion lithography [6154-47]

Nawata, T., Inui, Y., Masada, I., Nishijima, E., Satoh, H., Fukuda, T.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Second generation fluids for 193nm immersion lithography [6154-42]

French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Full-field exposure tools for ArF immersion lithography [6154-174]

Lee A, Otoguro A, Itani, T, Fujii K, Shiraishi K, Fujiwara T, Ishii Y

SPIE - The International Society of Optical Engineering
9 Conference Proceedings High refractive index immersion fluids for 193 nm immersion lithography

Bridgette Budhlall, Gene Parris, Peng Zhang, Xiaoping Gao, Zarka Zarkov, Brenda Ross, Simon Kaplan, John Burnett

SPIE - The International Society of Optical Engineering
4 Conference Proceedings High-index fluoride materials for 193-nm immersion lithography

T. Nawata, Y. Inui, I. Masada, E. Nishijima, T. Mabuchi, N. Mochizuki, H. Satoh, T. Fukuda

SPIE - The International Society of Optical Engineering
10 Conference Proceedings High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography

K. E. Gonsalves, M. Wang, N. S. Pujari

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings 193-nm immersion lithography for high volume manufacturing using novel immersion exposure tool and coater/developer system

S. Wakamizu, H. Kyouda, K. Nakano, T. Fujiwara

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Development of an operational high refractive index resist for 193nm immersion lithography

P. A. Zimmerman, J. Byers, E. Piscani, B. Rice, C. K. Ober

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Development status of a 193-nm immersion exposure tool [6154-68]

Chibana, T., Nakano, H., Hata, H., Kodachi, N., Sano N, Arakawa, M., Matsuoka, Y., Kawasaki, Y., Mori, S., Chiba, K.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings High-index optical materials for 193-nm immersion Iithogrqphy [6154-45]

Burnett, J. H., Kaplan, S. G., Shirley, E. L., Horowitz, D., Clauss, W., Grenville, A., Van Peski, C.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12