Minimization of image placement errors in chromeless phase-shift mask lithography
- Author(s):
Fritze, M. ( MIT Lincoln Lab. (USA) ) Tyrrell, B. Cann, S.G. Carney, C. ( Arch Chemicals, Inc. (USA) ) Blachowicz, B.A. Brzozowy, D. Kocab, T. Bowdoin, S. ( Schlumberger Ltd. (USA) ) Rhyins, P.D. ( Photronics Inc. (USA) ) Progler, C.J. Martin, P. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 426
- Page(to):
- 436
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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