Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering — 大電力パルスマグネトロンスパッタを用いた炭素系薄膜の特性 | 東京工業大学附属図書館文献データベース

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大電力パルスマグネトロンスパッタを用いた炭素系薄膜の特性
Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering

Author(s):

Yoshiaki YOSHIDA

Tatsuyuki NAKATANI

Publication title:

真空 : journal of the Vacuum Society of Japan

Pub. Year:

2017

Vol.:

60

Issue:

9

Page(from):

341

Page(to):

345

Pages:

5

Pub. info.:

東京: 真空協会

ISSN:

18822398

Language:

Japanese

Type:

Academic Journal

Details

TDL ID:	ZA00066506
Note for article:	小特集:高電力パルススパッタ (HiPIMS). 研究論文

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