Development of Thermal Plasma Jet Induced Annealing Technology and Its Application to Electronic Device Fabrication, 熱プラズマジェットを用いた熱処理技術の開発と電子デバイスプロセスへの応用

熱プラズマジェットを用いた熱処理技術の開発と電子デバイスプロセスへの応用
Development of Thermal Plasma Jet Induced Annealing Technology and Its Application to Electronic Device Fabrication

Author(s):

Publication title:

真空 : journal of the Vacuum Society of Japan

Pub. Year:

2017

Vol.:

60

Issue:

3

Page(from):

77

Page(to):

80

Pages:

4

Pub. info.:

東京: 真空協会

ISSN:

18822398

Language:

Japanese

Type:

Academic Journal

Details

TDL ID:	ZA00066506
Note for article:	小特集 1:プラズマ励起プロセスを用いた表面改質の基礎と応用. 解説

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熱プラズマジェットを用いた熱処理技術の開発と電子デバイスプロセスへの応用Development of Thermal Plasma Jet Induced Annealing Technology and Its Application to Electronic Device Fabrication

Similar Items:

熱プラズマジェットを用いた熱処理技術の開発と電子デバイスプロセスへの応用
Development of Thermal Plasma Jet Induced Annealing Technology and Its Application to Electronic Device Fabrication