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RF マグネトロンスパッタ法により作製した ZnO 薄膜に及ぼすイオン照射の影響
Effect of Ion Irradiation on ZnO Thin Film Prepared using RF Magnetron Sputtering

Author(s):
Publication title:
真空 : journal of the Vacuum Society of Japan
Pub. Year:
2015
Vol.:
58
Issue:
9
Page(from):
351
Page(to):
355
Pages:
5
Pub. info.:
東京: 真空協会
ISSN:
18822398
Language:
Japanese
Type:
Academic Journal

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