Monitoring the removal of excited particles in He/Ar/H2 low temperature afterglow plasma at 80-300 K

Monitoring the removal of excited particles in He/Ar/H₂ low temperature afterglow plasma at 80-300 K

Author(s):

Ábel Kálosi

Publication title:

The European physical journal. Applied physics : EPJ

Pub. Year:

2016

Vol.:

75

Issue:

2

Page(from):

24707

Page(to):

24707

Pages:

7

Pub. info.:

Strasbourg: EDP Sciences

ISSN:

12860042

Language:

English

Type:

Academic Journal

Details

TDL ID:	ZA00066291
Note for article:	6th Central European Symposium on Plasma Chemistry (CESPC-6) / edited by Nicolas Gherardi, Ester Marotta and Cristina Paradisi

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