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OPC modeling by genetic algorithm

Author(s):
W.C. Huang
C.M. Lai
B. Luo
C.K. Tsai
C.S. Tsay
C.W. Lai
C.C. Kuo
R.G. Liu
H.T. Lin
B.J. Lin
5 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
2
Page(from):
1229
Page(to):
1240
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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