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Diffusion contributions to line end shortening in 193-nm photolithography

Author(s):
Eun-Kyung Son
Jung-Woo Kim
Sang-Hyang Lee
Chan-Sik Park
Jae-Woo Lee
Jaehyun Kim
Geun-Su Lee
Sung-Koo Lee
Keun-Do Ban
Jae-Chang Jung
Cheol Kyu Bok
Seung-Chan Moon
7 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(2)
Pub. Year:
2005
Pt.:
2
Page(from):
1040
Page(to):
1048
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-2
Type:
Conference Proceedings

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