Blank Cover Image

Combined pattern collapse and LWR control at the 70 nm node through application of novel surface conditioner solutions

Author(s):
Peng Zhang
Manuel Jaramillo
Madhukar B. Rao
Brenda Ross
Bridget Horvath
Patrick Wong
Wendy Gehoel
Stephan Sinkwitz
3 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(2)
Pub. Year:
2005
Pt.:
2
Page(from):
1018
Page(to):
1023
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Electron beam direct write process development for sub 45nm CMOS manufacturing

Zhang, P., Jaramillo, M. Jr., Rao, M. B., Ross, B., Horvath, B., Wong, P., Gehoel, W., Sinkwitz, S.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Process optimization for sub-100-nm gate patterns using phase edge lithography

Schenau,K.van Ingen, Vleeming,B., Ansem,W.F.Gehoel-van, Wong,P., Vandenberghe,G.N.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Formulated surface conditioners in 50 nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

M. Sugiyama, M. Sanada, S. Wang, P. Wong, S. Sinkwitz, M. Jaramillo, Jr., G. Parris

SPIE - The International Society of Optical Engineering
8 Conference Proceedings High refractive index immersion fluids for 193 nm immersion lithography

Bridgette Budhlall, Gene Parris, Peng Zhang, Xiaoping Gao, Zarka Zarkov, Brenda Ross, Simon Kaplan, John Burnett

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Surface conditioning solutions for pattern collapse reduction

Zhang, P., Jaramillo, M., Jr., King, D.M., Rao, M.B., O'Brien, B.L., Ross, B.F.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Patterning capability and limitations by pattern collapse in 45nm and below node photo mask production

G. -H. Hwang, M. Patil, S. -K. Seo, C. -B. Yu, I. -B. Hur

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Surface conditioning solutions to reduce resist line roughness

Zhang, P., Jaramillo, M., Jr., Rao, M.B., Yates, C., King, D.M., Ross, B.F., O'Brien, B.L.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Impact of surfactant in developer and rinse solution on 193-nm lithography performance

Zhang, P., Jaramillo, M. Jr.,, King, D.M., Ross, B., Witko, D., Paxton, T.A., Davis, T.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Raster scan patterning solution for 100-and 70-nm OPC masks

Abboud, F.E., Baik, K.-H., Chakarian, V., Cole, D. M., Dean, R.L., Gesley M.A., Gillman. H., Moore, W.C., Mueller, M., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography

Padmanaban, M., Renfkiewicz, D., Lee, S., Hong, C., Lee, D., Rahman, D., Sakamuri, R., Dammel, R. R.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Phenomena and OPC solution of ripple patterns for 65-nm node

Lai, C.-M., Ho, J.-S., Lai, C.-W., Tsai, C.-K., Tsay, C.-S., Chen, J.-H., Liu, R.-G., Ku, Y.C., Lin, B.-J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12