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Fluids and resists for hyper NA immersion lithography

Author(s):
J. Christopher Taylor
Ramzy Shayib
Sumarlin Goh
Charles R. Chambers
Will Conley
Shang-Ho Lin
C. Grant Willson
2 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(2)
Pub. Year:
2005
Pt.:
2
Page(from):
836
Page(to):
846
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-2
Type:
Conference Proceedings

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