Characterization and modeling of a chemically amplified resist for ArF lithography
- Author(s):
- Publication title:
- Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2438
- Pub. Year:
- 1995
- Pt.:
- 1
- Page(from):
- 486
- Page(to):
- 495
- Pages:
- 10
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417862 [0819417866]
- Language:
- English
- Call no.:
- P63600/2438
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists
American Chemical Society |
2
Conference Proceedings
Extendibility of chemically amplified resists: another brick wall? (Invited Paper)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
American Chemical Society |
9
Conference Proceedings
Experimental method for quantifying acid diffusion in chemically amplified resists
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Effect of humidity on deprotection kinetics in chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Real-time analysis of volatiles formed during processing of a chemically amplified resist
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |