SEMATECH and the national technology roadmap: needs and challenges

SEMATECH and the national technology roadmap: needs and challenges

Author(s):: K.H. Brown
Publication title:: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 2438
Pub. Year:: 1995
Pt.:: 1
Page(from):: 33
Page(to):: 39
Pages:: 7
Pub. info.:: Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:: 0277786X
ISBN:: 9780819417862 [0819417866]
Language:: English
Call no.:: P63600/2438
Type:: Conference Proceedings

Details

TDL ID:	ZA00057641
Series ID:	PA00000029
Conf. info. (Name):	Symposium on advances in resist technology and processing
Conf. info. (Number):	12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1995.02.20-1995.02.22
Note for article:	12th Symposium on advances in resist technology and processing, February 20-22, 1995, Santa Clara, CA, USA. 2438-103

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