Extreme ultraviolet lithography for circuit fabrication at 0.1-µm feature size

Extreme ultraviolet lithography for circuit fabrication at 0.1-µm feature size

Author(s):

Publication title:

Applications of laser plasma radiation II : 12-14 July 1995, San Diego, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2523

Pub. Year:

1995

Page(from):

23

Page(to):

28

Pages:

6

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819418821 [081941882X]

Language:

English

Call no.:

P63600/2523

Type:

Conference Proceedings

Details

TDL ID:	ZA00057725
Series ID:	PA00000029
Conf. info. (Name):	Symposium on applications of laser plasma radiation
Conf. info. (Number):	2nd
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	1995.07.12-1995.07.14
Note for article:	2nd Symposium on applications of laser plasma radiation, July 12-14, 1995, San Diego, CA, USA. 2523-02

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