Pellicles designed for high-performance lithographic processes
- Author(s):
- J.S. Gordon
- Publication title:
- Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2512
- Pub. Year:
- 1995
- Page(from):
- 99
- Page(to):
- 113
- Pages:
- 15
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819418708 [0819418706]
- Language:
- English
- Call no.:
- P63600/2512
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Control of polarization and apodization with film materials on photomasks and pellicles for high NA imaging performance
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Novel Optical and E-Beam Lithographic Techniques for Semiconductor Processing
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Application of an Automated Contact Angle Measurement Instrument to Advanced Lithographic and Wafer Cleaning Processes
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |