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Interferometric phase shift technique for high-resolution deep-UV microlithography

Author(s):
Publication title:
Tenth International Symposium on Gas Flow and Chemical Lasers : 5-9 September 1994, Friedrichshafen, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2502
Pub. Year:
1995
Page(from):
617
Page(to):
624
Pages:
8
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819418609 [0819418609]
Language:
English
Call no.:
P63600/2502
Type:
Conference Proceedings

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