Optimization of measurement process variables used in radiance uniformity calibration of the emitter source for the wideband infrared scene projector (WISP)

Optimization of measurement process variables used in radiance uniformity calibration of the emitter source for the wideband infrared scene projector (WISP)

Author(s):

Publication title:

Targets and backgrounds : characterization and representation : 17-19 April 1995, Orlando, Florida

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2469

Pub. Year:

1995

Page(from):

118

Page(to):

131

Pages:

14

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819418227 [0819418226]

Language:

English

Call no.:

P63600/2469

Type:

Conference Proceedings

Details

TDL ID:	ZA00057671
Series ID:	PA00000029
Conf. info. (Name):	Symposium on targets and backgrounds
Conf. info. (Number):	1995
Conf. info. (Venue):	Orlando, FL, USA
Conf. info. (Date):	1995.04.17-1995.04.19
Note for article:	1995 Symposium on targets and backgrounds, April 17-19, 1995, Orlando, FL, USA. 2469-13

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