Blank Cover Image

Optical lithography technique with dummy diffraction mask for 0.20 µm T-shaped gate formation

Author(s):
Publication title:
Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2440
Pub. Year:
1995
Page(from):
850
Page(to):
859
Pages:
10
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417886 [0819417882]
Language:
English
Call no.:
P63600/2440
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Optimization of electron-beam lithography for super-low-noise HEMTs

Choi,S.-S., Lee,J.-H., Yun,H.S., Chung,H.B., Lee,S.Y., Yoo,H.J.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings New development of cost-effective sub-0.18-ｦﾌm lithography with i-line

Chung,H.-S., Jung,J.-H., Kim,Y.S., Choi,K.-S., Yoo,N.H., Yoon,S., Park,J.-E.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure

Choi,S.-S., Jeon,Y.J., Kim,J.-S., Chung,H.B., Lee,S.Y., Lee,J.H., Yoo,H.J.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Practical implementation of top-surface imaging process by silylation to sub-0.20-ｦﾌm lithography

Park,B.J., Baik,K.H., Kim,H.K., Kim,J.W., Bok,C.K., Vertommen,J., Rosenlund,R.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Performance of small-field 193-nm exposure system

Kim,D.H., Lee,K.H., Kim,J.S., Choi,S.S., Oh,H.-K., Chung,H.B., Yoo,H.J.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Abnormal Crystal Growth in the Sintered (Bi0.2Sb0.8)2Te3 Alloys Induced by Silver Addition

Yoo, H.J., Park, Y.H., Park, I.M.

Trans Tech Publications
4 Conference Proceedings Performance analysis of ArF excimer laser lithography optics

Lee,K.H., Kim,D.H., Kim,J.S., Chung,H.B., Yoo,H.J.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Advanced mask cleaning for 0.20-ｦﾌm technology:an integrated user-supplier approach

Poschenrieder,R., Hay,B., Beier,M., Hourd,A.C., Stumer,H., Gairing,T.M.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Optimum combination of source, mask, and filter for better lithographic performance

H.-K. Oh, J.-U. Koo, Y.-M. Cho, B.-S. Park, H.B. Chung

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools

Kim,D.H., Nam,B.-H., Lee,K.H., Chung,H.B., Yoo,H.J.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Catadioptric Systems for Sub-Quarter Micron Lithography,

Lee,K.H., Chung,H.B., Kim,D.H., Yoo,H.J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Design of illumination system for ArF excimer laser step-and-scanner

Lee,K.H., Kim,D.H., Kim,J.S., Choi,S.-S., Chung,H.B., Yoo,H.J., Kim,B.W.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12