Pattern-dependent correction of mask topography effects for alternating phase-shifting masks

Pattern-dependent correction of mask topography effects for alternating phase-shifting masks

Author(s):

Publication title:

Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2440

Pub. Year:

1995

Page(from):

349

Page(to):

360

Pages:

12

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417886 [0819417882]

Language:

English

Call no.:

P63600/2440

Type:

Conference Proceedings

Details

TDL ID:	ZA00057643
Series ID:	PA00000029
Conf. info. (Name):	Symposium on optical/laser microlithography
Conf. info. (Number):	8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1995.02.22-1995.02.24
Note for article:	8th Symposium on optical/laser microlithography, February 22-24, 1995, Santa Clara, CA, USA. 2440-30

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