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Progress on accurate metrology of pitch, height, roughness, and width artifacts using an atomic force microscope

Author(s):
Publication title:
Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2439
Pub. Year:
1995
Page(from):
401
Page(to):
417
Pages:
17
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417879 [0819417874]
Language:
English
Call no.:
P63600/2439
Type:
Conference Proceedings

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