Lithography simulation of contamination-caused defects
- Author(s):
- Publication title:
- Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2439
- Pub. Year:
- 1995
- Page(from):
- 198
- Page(to):
- 209
- Pages:
- 12
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417879 [0819417874]
- Language:
- English
- Call no.:
- P63600/2439
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Application of rigorous topography simulation for modeling of defect propagation/growth in VLSI fabrication
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Propagation of EM waves in axial symmetric structures and its implication for 3D rigorous lithography process simulation
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Method of easily extracting resist development parameters for lithography simulation
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
A superfast 3D lithography simulator and its application for ULSI printability analysis
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
SPIE - The International Society for Optical Engineering |