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Error measure comparison of currently employed dose-modulation schemes for e-beam proximity effect control

Author(s):
Publication title:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2437
Pub. Year:
1995
Page(from):
222
Page(to):
239
Pages:
18
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417855 [0819417858]
Language:
English
Call no.:
P63600/2437
Type:
Conference Proceedings

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