Surface charge effects in silicon wafer cleaning using surfactant-containing solutions

Surface charge effects in silicon wafer cleaning using surfactant-containing solutions

Author(s):

Publication title:

Optical characterization techniques for high-performance microelectronic device manufacturing : 20 October 1994, Austin, Texas

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2337

Pub. Year:

1994

Page(from):

13

Page(to):

19

Pages:

7

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819416704 [0819416703]

Language:

English

Call no.:

P63600/2337

Type:

Conference Proceedings

Details

TDL ID:	ZA00057540
Series ID:	PA00000029
Conf. info. (Name):	Symposium on optical characterization techniques for high-performance microelectronic device manufacturing
Conf. info. (Number):	1994
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1994.10.20
Note for article:	1994 Symposium on optical characterization techniques for high-performance microelectronic device manufacturing, October 20, 1994, Austin, TX, USA. 2337-03

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