Blank Cover Image

Chromium-based attenuated embedded shifter preproduction

Author(s):
Publication title:
14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2322
Pub. Year:
1994
Page(from):
299
Page(to):
304
Pages:
6
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819416537 [0819416533]
Language:
English
Call no.:
P63600/2322
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Chromium-based attenuated embedded phase-shift photomask blanks for use in 1X lithography

Schurz,D.L., Tai,E., Kalk,F.D.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Mask fabrication in the USA (Invited Paper)

Kalk,F.D.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings TiSi-nitride attenuating phase-shift photomask for 193-nm lithography

Reynolds,G.A.M., French,R.H., Carcia,P.F., Torardi,C.C., Hughes,G.P., Jones,D.J., Lemon,M.F., Reilly,M., Wilson,L., …

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Aerial image-based mask inspection: a development effort to detect what might impact printing image quality on wafers

Liebe, R., Haffner, H., Hemar, S., Rosenbusch, A., Chen, J.X., Kalk, F.D.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography

Carcia,P.F., French,R.H., Sharp,K.G., Meth,J.S., Smith,B.W.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Pinhole defect detection and printability prediction

Kalk,F.D., Vacca,A., Radcliff,P.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Optical superlattices as phase-shift masks for microlithography

Carcia,P.F., French,R.H., Reynolds,G.A.M., Hughes,G.P., Torardi,C.C., Reilly,M.H., Lemon,M.F., Miao,C.R., Jones,D.J., …

SPIE - The International Society for Optical Engineering
10 Conference Proceedings DUV pellicle quality assessment based on customer priorities

Wood,J.L., Eynon,B.G., Kalk,F.D.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Embedded attenuating phase-shift mask:printability of defects

Singh,R.R., Williams,A., Yuan,C.-M., Hughes,G.P., Foss,G., Martino,R.M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Chromium-based attenuated phase shifter for DUV exposure

H. Mohri, M. Takahashi, K. Mikami, H. Miyashita, N. Hayashi

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Film stress and geometry effects in chrome photomask cleaning damage

Alpay,H.U., Wood,J.L., Kalk,F.D.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Silicon-oxynitride films prepared for 157-nm attenuated phase-shifting masks

Chen,H.L., Wang,L.A., Yeh,L.S., Lai,F.D.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12