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Evaluation of image-placement distortion contributors of the EL-3+ electron-beam lithography system in x-ray mask fabrication

Author(s):
Publication title:
14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2322
Pub. Year:
1994
Page(from):
92
Page(to):
101
Pages:
10
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819416537 [0819416533]
Language:
English
Call no.:
P63600/2322
Type:
Conference Proceedings

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