Jonathan G. Baker, Stacey F. Bent, A.J.M. Mackus
American Institute of Chemical Engineers
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Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
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Ieva Narkeviciute, Pongkarn Chakthranont, Christopher Hahn, A.J.M. Mackus, Stacey F. Bent
American Institute of Chemical Engineers
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Ieva Narkeviciute, Pongkarn Chakthranont, Christopher Hahn, A.J.M. Mackus, Stacey F. Bent
American Institute of Chemical Engineers
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Ieva Narkeviciute, Pongkarn Chakthranont, Christopher Hahn, A.J.M. Mackus, Stacey F. Bent
American Institute of Chemical Engineers
|
Marja N. Mullings, Jonathan R. Bakke, Carl Hägglund, Stacey F. Bent
American Institute of Chemical Engineers
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Ieva Narkeviciute, Pongkarn Chakthranont, Christopher Hahn, A.J.M. Mackus, Stacey F. Bent
American Institute of Chemical Engineers
|
Marja N. Mullings, Jonathan R. Bakke, Carl Hägglund, Stacey F. Bent
American Institute of Chemical Engineers
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Joseph Singh, Stacey F. Bent, Nuoya Yang
American Institute of Chemical Engineers
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Marja N. Mullings, Jonathan R. Bakke, Carl Hägglund, Stacey F. Bent
American Institute of Chemical Engineers
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