Lalit A. Darunte, Christopher W. Jones, Krista S. Walton, David S. Sholl
American Institute of Chemical Engineers
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Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Anshuman Sinha, Lalit A. Darunte, Christopher W. Jones, Yoshiaki Kawajiri, Matthew Realff
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Anshuman Sinha, Lalit A. Darunte, Christopher W. Jones, Yoshiaki Kawajiri, Matthew Realff
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Anshuman Sinha, Lalit A. Darunte, Christopher W. Jones, Yoshiaki Kawajiri, Matthew Realff
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Stephanie A. Didas, Ambarish R. Kulkarni, David S. Sholl, Christopher W. Jones
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Sunho Choi, McMahan L. Gray, Taku Watanabe, David Sholl, Christopher W. Jones
American Institute of Chemical Engineers
|