Logan R. Matthews, Alexander M. Niziolek, Onur Onel, Neesha Pinnaduwage, Mark Holtzapple
American Institute of Chemical Engineers
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Logan R. Matthews, Yannis A. Guzman, Onur Onel, Alexander M. Niziolek, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Logan R. Matthews, Yannis A. Guzman, Onur Onel, Alexander M. Niziolek, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Logan R. Matthews, Yannis A. Guzman, Onur Onel, Alexander M. Niziolek, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Logan R. Matthews, Yannis A. Guzman, Onur Onel, Alexander M. Niziolek, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Logan R. Matthews, Onur Onel, Yannis A. Guzman, Alexander M. Niziolek, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Logan R. Matthews, Yannis A. Guzman, Onur Onel, Alexander M. Niziolek, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Onur Onel, Alexander M. Niziolek, Logan R. Matthews, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Alexander M. Niziolek, Onur Onel, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Onur Onel, Alexander M. Niziolek, Logan R. Matthews, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Alexander M. Niziolek, Onur Onel, Christodoulos A. Floudas
American Institute of Chemical Engineers
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William W. Tso, Alexander M. Niziolek, Onur Onel, Christodoulos A. Floudas
American Institute of Chemical Engineers
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