Rajamani Gounder, Fabio H. Ribeiro, W. Nicholas Delgass, William F. Schneider, Jeffrey T. Miller
American Institute of Chemical Engineers
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Ja Hun Kwak, Feng Gao, Janos Szanyi, Jong-Hwan Lee, Charles H.F. Peden
American Institute of Chemical Engineers
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Fabio H. Ribeiro, W. Nicholas Delgass, William F. Schneider, Jeffrey T. Miller, Rajamani Gounder
American Institute of Chemical Engineers
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Ishant Khurana, Atish A. Parekh, Jonatan Albarracin, Christopher Paolucci, Arthur Shih
American Institute of Chemical Engineers
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John R. Di Iorio, Ishant Khurana, W. Nicholas Delgass, Fabio H. Ribeiro, Jeffrey T. Miller
American Institute of Chemical Engineers
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Ishant Khurana, Atish A. Parekh, Jonatan Albarracin, Christopher Paolucci, Arthur Shih
American Institute of Chemical Engineers
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Christopher Paolucci, Anuj Verma, Shane A. Bates, Jeffrey T. Miller, Rajamani Gounder
American Institute of Chemical Engineers
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Abhijit A. Phatak, Kendall T. Thomson, W. Nicholas Delgass, Fabio H. Ribeiro, William F. Schneider
American Institute of Chemical Engineers
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Shane A. Bates, Vincent F. Kispersky, Jeffrey T. Miller, Jean-Sabin McEwen, Atun Anggara
American Institute of Chemical Engineers
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Wen-Sheng Lee, M. Cem Akatay, Eric A. Stach, Fabio H. Ribeiro, W. Nicholas Delgass
American Institute of Chemical Engineers
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Shane A. Bates, Anuj Verma, W. Nicholas Delgass, Fabio H. Ribeiro, Jeffrey T. Miller
American Institute of Chemical Engineers
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Jean-Sabin McEwen, Atun Anggara, William F. Schneider, Vincent F. Kispersky, Shane A. Bates
American Institute of Chemical Engineers
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