Ray Wang, Michael Baldea, Thomas F. Edgar, Mark Nixon, Willy Wojsznis
American Institute of Chemical Engineers
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Ankur Kumar, Michael Baldea, Thomas F. Edgar
American Institute of Chemical Engineers
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Ray Wang, Michael Baldea, Thomas F. Edgar, Mark Nixon, Willy Wojsznis
American Institute of Chemical Engineers
|
Krystian X. Perez, Michael Baldea, Thomas F. Edgar
American Institute of Chemical Engineers
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Shu Xu, Willy Wojsznis, Mark Nixon, Michael Baldea, Thomas F. Edgar
American Institute of Chemical Engineers
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Abigail Ondeck, Thomas F. Edgar, Michael Baldea
American Institute of Chemical Engineers
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Ray Wang, Michael Baldea, Thomas F. Edgar, Ricardo Dunia
American Institute of Chemical Engineers
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Abigail Ondeck, Michael Baldea, Thomas F. Edgar
American Institute of Chemical Engineers
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Hari S. Ganesh, Thomas F. Edgar, Michael Baldea
American Institute of Chemical Engineers
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Abigail Ondeck, Michael Baldea, Thomas F. Edgar
American Institute of Chemical Engineers
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Ricardo Dunia, Thomas F. Edgar, Gary Rochelle, Mark Nixon
American Institute of Chemical Engineers
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Ankur Kumar, Michael Baldea, Thomas F. Edgar
American Institute of Chemical Engineers
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