Siddharth Parimal, James A. Woo, Kartik Srinivasan, Melissa A. Holstein, Shekhar Garde
American Institute of Chemical Engineers
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Steven M. Cramer, Alex Freed, Melissa Holstein, Ying Hou, Siddharth Parimal
American Institute of Chemical Engineers
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Siddharth Parimal, James A. Woo, Kartik Srinivasan, Melissa A. Holstein, Shekhar Garde
American Institute of Chemical Engineers
|
Srinavya Vutukuru, Sridhar R. Bethi, Ravi S. Kane
American Institute of Chemical Engineers
|
Melissa A. Holstein, Siddharth Parimal, Ying Hou, Alex Freed, Scott A. McCallum
American Institute of Chemical Engineers
|
Christopher L. Kitchens, Ashley E. Hart, O. Thompson Mefford, Brian A. Powell, Dan D'Unger
American Institute of Chemical Engineers
|
Melissa A. Holstein, Siddharth Parimal, Ying Hou, Alex Freed, Scott A. McCallum
American Institute of Chemical Engineers
|
Christopher L. Kitchens, Ashley E. Hart, O. Thompson Mefford, Brian A. Powell, Dan D'Unger
American Institute of Chemical Engineers
|
Siddharth Parimal, Melissa A. Holstein, Shekhar Garde, Steven M. Cramer
American Institute of Chemical Engineers
|
C.L. Kitchens, A.E. Hart, O.T. Mefford, B.A. Powell, D. D'Unger
American Institute of Chemical Engineers
|
Siddharth Parimal, Melissa A. Holstein, Shekhar Garde, Steven M. Cramer
American Institute of Chemical Engineers
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Riedi C. P., Lord S. J.
Kluwer Academic Publishers
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