Saikrishna Mukkamala, William J. DeSisto, M. Clayton Wheeler, Adriaan van Heiningen
American Institute of Chemical Engineers
|
Hamad Almohamadi, William J. Desisto, Clayton Wheeler
American Institute of Chemical Engineers
|
Saikrishna Mukkamala, William J. DeSisto, M. Clayton Wheeler, Adriaan van Heiningen
American Institute of Chemical Engineers
|
Hamad Almohamadi, William J. Desisto, Clayton Wheeler
American Institute of Chemical Engineers
|
Saikrishna Mukkamala, William J. DeSisto, M. Clayton Wheeler, Adriaan van Heiningen
American Institute of Chemical Engineers
|
Sedat H. Beis, Saikrishna Mukkamala, Nick Hill, Heini Lehtonen, Adriaan Van Heiningen
American Institute of Chemical Engineers
|
Sedat H. Beis, Saikrishna Mukkamala, Nick Hill, Ta-Hsuan Ong, Adriaan Van Heiningen
American Institute of Chemical Engineers
|
Sedat H. Beis, Saikrishna Mukkamala, Nick Hill, Heini Lehtonen, Adriaan Van Heiningen
American Institute of Chemical Engineers
|
Sedat H. Beis, Saikrishna Mukkamala, Nick Hill, Ta-Hsuan Ong, Adriaan Van Heiningen
American Institute of Chemical Engineers
|
Pamela Ruiz, Keith D. Hurley, Brian G. Frederick, William J. DeSisto, Adriaan Van Heiningen
American Institute of Chemical Engineers
|
Sedat H. Beis, Saikrishna Mukkamala, Nick Hill, Ta-Hsuan Ong, Adriaan Van Heiningen
American Institute of Chemical Engineers
|
Scott Eaton, M. Clayton Wheeler, Sedat H. Beis, Sampath A. Karunarathne, Adriaan Van Heiningen
American Institute of Chemical Engineers
|