Douglas R. Kauffman, Dominic Alfonso, Christopher Matranga, Huifeng Qian, Rongchao Jin
American Institute of Chemical Engineers
|
Sittichai Natesakhawat, Victor Abdelsayed, Paul R. Ohodnicki Jr., Bret H. Howard, Jonathan W. Lekse
American Institute of Chemical Engineers
|
Douglas R. Kauffman, Dominic Alfonso, Christopher Matranga, Huifeng Qian, Rongchao Jin
American Institute of Chemical Engineers
|
Sittichai Natesakhawat, Victor Abdelsayed, Jonathan W. Lekse, John P. Baltrus, Paul R. Ohodnicki Jr.
American Institute of Chemical Engineers
|
Jonathan W. Lekse, James, P. Lewis, M. Kylee Underwood, Christopher Matranga
American Institute of Chemical Engineers
|
Sittichai Natesakhawat, Victor Abdelsayed, Jonathan W. Lekse, John P. Baltrus, Paul R. Ohodnicki Jr.
American Institute of Chemical Engineers
|
Jonathan W. Lekse, James, P. Lewis, M. Kylee Underwood, Christopher Matranga
American Institute of Chemical Engineers
|
Christopher Matranga, Jeffrey Culp, Fan Shi
American Institute of Chemical Engineers
|
Steven R. Saunders, Christopher B. Roberts
American Institute of Chemical Engineers
|
Christopher Matranga, Jeffrey Culp, Fan Shi
American Institute of Chemical Engineers
|
Steven R. Saunders, Christopher B. Roberts
American Institute of Chemical Engineers
|
Steven R. Saunders, Christopher Roberts
American Institute of Chemical Engineers
|