Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Lalit A. Darunte, Christopher W. Jones, Krista S. Walton, David S. Sholl
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Lalit A. Darunte, Christopher W. Jones, Krista S. Walton, David S. Sholl
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Anshuman Sinha, Lalit A. Darunte, Christopher W. Jones, Yoshiaki Kawajiri, Matthew Realff
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Anshuman Sinha, Lalit A. Darunte, Christopher W. Jones, Yoshiaki Kawajiri, Matthew Realff
American Institute of Chemical Engineers
|
Ambarish R. Kulkarni, Stephanie A. Didas, Christopher W. Jones, David S. Sholl
American Institute of Chemical Engineers
|
Anshuman Sinha, Lalit A. Darunte, Christopher W. Jones, Yoshiaki Kawajiri, Matthew Realff
American Institute of Chemical Engineers
|
Stephanie A. Didas, Ambarish R. Kulkarni, David S. Sholl, Christopher W. Jones
American Institute of Chemical Engineers
|
Jason Gee, Ambarish R. Kulkarni, David S. Sholl
American Institute of Chemical Engineers
|